美*** OAI 光刻機 Model 200 型桌面掩模對準器系統
完全手工操作
。輸出光譜范圍:Hg: G(436海里),H(405海里),I(365nm)和310nm線，Hg-Xe: 260nm和220nm或LED: 365nm, 395nm, 405nm
。襯底從塊大小8平方
。互換拋擲和面具
。紫外燈功率范圍從200到2000 w
。選擇紫外LED光源(365 nm和405 nm)
。空氣軸承真空吸盤
。接近(15-20um): & lt; 3.0 - 5.0, 軟接觸:2.0um，硬觸點:1um和真空接點:≤0.5um
。對齊模塊X, Y,和Z軸和θ
。雙通道光學反饋
。只提供正面接觸w / IR選項
。可用在桌面選項只適用于研發(fā)及獨立工作
。.占用空間小
。適用于生物學、微機電系統、半導體和 Microfludics CLiPP應用程序
Model 200 Table Top Mask Aligner System
Complete Manual Operation
。 Output Spectra Range: Hg: G (436nm), H (405nm),I(365nm) ａnd 310nm lines, Hg-Xe: 260nm ａnd 220nm orLED: 365nm, 395nm ａnd 405nm
。Substrate Sizes from Pieces to 8” sq
。 Interchangeable chucks ａnd mask holders
。 UV Lamp Power range from 200 to 2,000W
。Option for UV LED (365nm ａnd 405nm) Light Source
。 Air bearing vacuum chuck
。 Proximity (15-20um): <3.0 – 5.0um,
Soft Contact:<2.0um, Hard contact: 1um and
vacuum contact : ≤ 0.5um
。Alignment module X, Y, ａnd Z axis ａnd theta
。 Dual-channel optical feedback
。 Provides Front side exposure only w/ IR Option
。 Available in Table top option only ａnd applicable for R&D ａnd standalone work
。 Small Footprint
。 Applicable for Biology, MEMS, Semiconductor ａnd Microfludics, CLiPP application
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